Dispersion‐Controlled Gold–Aluminum–Silicon Dioxide–Aluminum Nanopawn Structures for Visible to NIR Light Modulation

Abstract As an efficient patterning method for nanostructures, nanocolloidal lithography (NCL) presents a controllable and scalable means achieving uniform good sidewall profile, high aspect ratio. While selectivity between the etching mask targeted materials is also essential NCL‐based precision nanophotonic structures, its realization in multi‐material structures still remains challenge due to dielectric‐ or metallic‐material‐dependent selectivity. Here, dispersion‐controlled Au‐NCL proposed, which enables Al SiO 2 over Au nanoparticle (Au‐NP) mask. Utilizing proposed process, wafer‐scale, uniformly dispersed nanopawn (Au‐NPs/Al–SiO cylinders) on ultrathin film are realized, obtaining excellent vertical ( ≈ 90 ° ) ratio > 1). The verticality of support optical modes highly sensitive excitation direction incident waves through mixing interface‐gap‐assisted localized surface plasmons (GLSPs) formed Au‐NP Al‐disk interface, plasmonic Fabry–Pérot (FP) substrate; complementary spectral responses reflected scattered light demonstrated. application example, information encryption based triple‐channel (i.e., reflection, scattering, transmission) angle‐dependent complementary‐color presented.